Author,Title,Kind,Status,ApplicantName,ApplicationDate,ApplicationNumber,PublicationDate,PublicationNumber,RegistrationDate,RegistrationNumber
"Setsuro Ito,HIDEO HOSONO,KATSURO HAYASHI,yoshitake toda","Ｃ１２Ａ７エレクトライドの薄膜の製造方法、およびＣ１２Ａ７エレクトライドの薄膜","Patent","Registered","国立大学法人東京工業大学, 旭硝子株式会社, 国立研究開発法人科学技術振興機構","2013/06/19","特願2014-521490","2016/05/26","再表2013/191210","特許第6198276号","2017/09/01"
"KATSURO HAYASHI,HIDEO HOSONO","マイエナイト複合材および電子放出用陰極","Patent","Registered","国立大学法人東京工業大学, 国立研究開発法人科学技術振興機構","2012/09/11","特願2012-199624","2014/03/27","特開2014-055313","特許第6062192号","2016/12/22"
"HIDEO HOSONO,Masahiro Hirano,KATSURO HAYASHI","１２ＣａＯ・７Ａｌ2Ｏ3化合物","Patent","Registered","国立大学法人東京工業大学, 株式会社ファンケル","2010/06/02","特願2011-518473","2012/11/22","特開（再表）2010-143574","特許第5723771号","2015/04/03"
"HIDEO HOSONO,Masahiro Hirano,KATSURO HAYASHI","１２ＣａＯ・７Ａｌ2Ｏ3化合物","Patent","Published","国立大学法人東京工業大学","2010/06/02","特願2011-518473","2012/11/22","特開（再表）2010-143574",,
"HIDEO HOSONO,Masahiro Hirano,KATSURO HAYASHI","抗酸化剤及び抗酸化化粧料","Patent","Registered","国立大学法人東京工業大学, 株式会社ファンケル","2008/11/10","特願2008-287781","2009/07/23","特開2009-161728","特許第5615491号","2014/09/19"
"HIDEO HOSONO,KATSURO HAYASHI","抗酸化剤及び抗酸化化粧料","Patent","Published","国立大学法人東京工業大学, 株式会社ファンケル","2008/11/10","特願2008-287781","2009/07/23","特開2009-161728",,
"HIDEO HOSONO,KATSURO HAYASHI,Masahiro Hirano","抗酸化剤","Patent","Registered","国立大学法人東京工業大学, 株式会社ファンケル","2007/10/25","特願2008-553958","2010/05/06","特開（再表）2008/087774","特許第5213122号","2013/03/08"
"HIDEO HOSONO,KATSURO HAYASHI","活性酸素を含有したオキシアパタイト及びその製造方法","Patent","Published","国立大学法人東京工業大学, 旭化成株式会社","2006/09/05","特願2006-240040","2007/04/12","特開2007-091582",,
"HIDEO HOSONO,KATSURO HAYASHI","活性酸素を含有したオキシアパタイト、その製造方法、及びそれからなる光触媒","Patent","Registered","国立大学法人東京工業大学, 旭化成株式会社","2006/09/05","特願2006-240041","2007/04/12","特開2007-090341","特許第4766685号","2011/06/24"
"HIDEO HOSONO,KATSURO HAYASHI","複合金属酸化物及び導電性複合金属酸化物の製造方法","Patent","Published","国立大学法人東京工業大学, 関西ペイント株式会社","2006/07/05","特願2006-185804","2008/01/24","特開2008-013396",,