Author,Title,Kind,Status,ApplicantName,ApplicationDate,ApplicationNumber,PublicationDate,PublicationNumber,RegistrationDate,RegistrationNumber
"Masahiko Nakase","高レベル放射性物質処理システム及び高レベル放射性物質処理方法","Patent","Published","国立大学法人東京工業大学, 三菱重工業株式会社","2021/05/31","特願2021-090800","2022/12/13","特開2022-183462",,
"Masahiko Nakase","高レベル放射性物質処理システム及び高レベル放射性物質処理方法","Patent","Published","国立大学法人東京工業大学, 三菱重工業株式会社","2020/03/30","特願2020-060280","2021/10/07","特開2021-156851",,
"Masahiko Nakase,KENJI TAKESHITA","ランタノイド及び／又はアクチノイドの分離法","Patent","Published","国立大学法人東京工業大学, 国立研究開発法人日本原子力研究開発機構","2020/02/28","特願2020-034169","2021/09/13","特開2021-134421",,