極薄SOI層と素子間分離領域を一体化する新技術:SBSI(Separation by Bonding Si Islands) -Si島とSi基板間の熱酸化-

Publication Information

Title

Japanese:	極薄SOI層と素子間分離領域を一体化する新技術:SBSI(Separation by Bonding Si Islands) -Si島とSi基板間の熱酸化-
English:

Author

Japanese:	大理洋征龍, 山崎崇, 盛田伸也, 袴田佳孝, 大見俊一郎, 酒井徹志.
English:	大理洋征龍, 山崎崇, 盛田伸也, 袴田佳孝, 大見俊一郎, 酒井徹志.

Language

Japanese

Journal/Book name

Japanese:	第65回応用物理学会学術講演会
English:

Volume, Number, Page

Vol. 2 pp. 745

Published date

2004

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English: