Properties of Hydrogenated Microcrystalline Cubic Silicon Carbide Films Deposited by Hot Wire Chemical Vapor Deposition at a Low Substrate Temperature

Publication Information

Title

Japanese:
English:	Properties of Hydrogenated Microcrystalline Cubic Silicon Carbide Films Deposited by Hot Wire Chemical Vapor Deposition at a Low Substrate Temperature

Author

Japanese:	宮島晋介, 山田明, 小長井誠.
English:	Shinsuke Miyajima, Akira Yamada, Makoto Konagai.

Language

English

Journal/Book name

Japanese:
English:	Japanese Journal of Applied Physics

Volume, Number, Page

Vol. 43 No. 9A/B pp. L1190

Published date

Sept. 2004

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

DOI