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Title
Japanese:修正埋め込み原子法のシリコンクラスタ（Si2～Si10）に対する適応性 
English: 
Author
Japanese: 八木周蔵, 高橋邦夫, 齊藤滋規, 恩澤忠男.  
English: 八木周蔵, 高橋邦夫, Shigeki SAITO, 恩澤忠男.  
Language Japanese 
Journal/Book name
Japanese:応用物理学会講演予稿集 
English: 
Volume, Number, Page Vol. 47        pp. 423
Published date 2000 
Publisher
Japanese: 
English: 
Conference name
Japanese: 
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Conference site
Japanese: 
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