Effects of deuterium on low-temperature Si epitaxy by photo-chemical vapor deposition | Tokyo Tech Research Repository (T2R2)

Publication Information

Title

Japanese:
English:	Effects of deuterium on low-temperature Si epitaxy by photo-chemical vapor deposition

Author

Japanese:	山田明.
English:	AKIRA YAMADA.

Language

English

Journal/Book name

Japanese:
English:	Jpn. J. Appl. Phys.

Volume, Number, Page

Vol. 30 pp. 5

Published date

1991

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

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