Comparison of Gas-phase Reaction in Low-temperature Growth of Si Films by Photochemical Vapor Deposition and the Hot Wire Cell Method

Publication Information

Title

Japanese:
English:	Comparison of Gas-phase Reaction in Low-temperature Growth of Si Films by Photochemical Vapor Deposition and the Hot Wire Cell Method

Author

Japanese:	Katsuya ABE, Takeshi TUSHIMA, Mitsuru ICHIKAWA, Akira YAMADA, Makoto KONAGAI.
English:	Katsuya ABE, Takeshi TUSHIMA, Mitsuru ICHIKAWA, Akira YAMADA, Makoto KONAGAI.

Language

English

Journal/Book name

Japanese:
English:	J. Non-Crystalline Solids

Volume, Number, Page

Vol. 266-269 pp. 105-109

Published date

2000

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English: