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Publication Information
Title
Japanese:
シリコンウェーハへの電気めっきの境界要素シミュレーション(LSI銅配線への応用)
English:
Boundary Element Simulation of Electroplating on Silicon Wafer
Author
Japanese:
青木繁,
天谷賢治
, 高沢宏彰, 宮坂松甫.
English:
青木繁,
天谷賢治
, 高沢宏彰, 宮坂松甫.
Language
Japanese
Journal/Book name
Japanese:
表面技術,
English:
Volume, Number, Page
Vol. 51 No. 4 pp. 425-430
Published date
2000
Publisher
Japanese:
English:
Conference name
Japanese:
English:
Conference site
Japanese:
English:
©2007
Tokyo Institute of Technology All rights reserved.