Characterization of Lu<sub>2</sub>O<sub>3</sub> High-k Thin Films on Si(100) Fabricated by E-beam Deposition Method

Publication Information

Title

Japanese:
English:	Characterization of Lu₂O₃ High-k Thin Films on Si(100) Fabricated by E-beam Deposition Method

Author

Japanese:	S.Ohmi, M.Takeda, H.Ishiwara, H. Iwai.
English:	S.Ohmi, M.Takeda, H.Ishiwara, H. Iwai.

Language

English

Journal/Book name

Japanese:
English:	ECS International Semiconductor Technology Conference 2002

Volume, Number, Page

pp. Abstract No.59

Published date

2002

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English: