Reduced Critical Thickness for Strain Relaxed Si1-yCy films grown on SOI substrates

Publication Information

Title

Japanese:	Reduced Critical Thickness for Strain Relaxed Si1-yCy films grown on SOI substrates
English:

Author

Japanese:	M. Murano, H. Ishihara, A. Yamada, M. Konagai.
English:	M. Murano, H. Ishihara, A. Yamada, M. Konagai.

Language

Japanese

Journal/Book name

Japanese:
English:

Volume, Number, Page

pp. *

Published date

2006

Publisher

Japanese:
English:

Conference name

Japanese:	25th Electronic Materials Sympoisum
English:

Conference site

Japanese:	伊豆長岡
English: