Fabrication of SiO2/Ge MIS Structures by Plasma Oxidation of Ultrathin Si Films Grown on Ge

Publication Information

Title

Japanese:
English:	Fabrication of SiO2/Ge MIS Structures by Plasma Oxidation of Ultrathin Si Films Grown on Ge

Author

Japanese:	H.Kumagai, M.Shichijo, H.Ishikawa, T.Hoshii, S.Sugahara, Y.Uchida, S.Takagi.
English:	H.Kumagai, M.Shichijo, H.Ishikawa, T.Hoshii, S.Sugahara, Y.Uchida, S.Takagi.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

pp. paper J-6-23, pp. 398-399

Published date

2006

Publisher

Japanese:
English:

Conference name

Japanese:
English:	2006 Intl. Conf. on Solid State Devices and Materials (SSDM 2006), Yokohama, Japan,

Conference site

Japanese:
English: