Gate Dielectric Formation and MIS Interface Characterization on Ge

Publication Information

Title

Japanese:
English:	Gate Dielectric Formation and MIS Interface Characterization on Ge

Author

Japanese:	S.Takagi, T.Maeda, N.Taoka, M.Nishizawa, Y.Morita, K.Ikeda, Y.Yamashita, M.Nishikawa, H.Kumagai, R.Nakane, 菅原聡, N.Sugiyama.
English:	S.Takagi, T.Maeda, N.Taoka, M.Nishizawa, Y.Morita, K.Ikeda, Y.Yamashita, M.Nishikawa, H.Kumagai, R.Nakane, S.Sugahara, N.Sugiyama.

Language

English

Journal/Book name

Japanese:
English:	Microelectronic Engineering

Volume, Number, Page

Vol. 84 No. 9-10 pp. 2314-2319

Published date

Sept. 2007

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

DOI