Home >

news Help

Publication Information


Title
Japanese:PLD 法で製膜した蛍石型酸化物の残留応力の測定と制御 
English:Evaluation and Control of Residual Stress in Fluorite-Type-Oxide Thin Films Deposited by PLD 
Author
Japanese: 村上晃浩, 高 鉉龍, 脇谷尚樹, 木口賢紀, Cross Jeffrey, 櫻井 修, 篠崎和夫.  
English: A. Murakami, H-Y. Go, N. Wakiya, T. Kiguchi, Cross Jeffrey, O. Sakurai, K. Shinozaki.  
Language Japanese 
Journal/Book name
Japanese:第22回日本セラミックス協会 秋季シンポジウム講演予稿集 
English:22nd Fall Meeting of The Ceramic Society of Japan 
Volume, Number, Page     No. 1PE03    pp. 136
Published date Sept. 2009 
Publisher
Japanese: 
English: 
Conference name
Japanese:第22回日本セラミックス協会 秋季シンポジウム 
English:22nd Fall Meeting of The Ceramic Society of Japan 
Conference site
Japanese:愛媛大学，愛媛 
English: 
Abstract In-plane and out-of-plane lattice parameters of epitaxial yttria-stabilized zirconia (YSZ) thin films deposited on (001)Si substrates by pulsed laser deposition (PLD) were determined by XRD reciprocal-space-mapping method. Residual stress was calculated by these lattice parameters and controlled by the annealing at the various temperatures. Deposited YSZ films showed the compressive stress along with the substrates. By the annealing, the residual stress of the films gradually changed to tensile.

©2007 Tokyo Institute of Technology All rights reserved.