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Title
Japanese: 
English:TiO2-Coated Transparent Conductive Oxide (SnO2:F) Films Prepared by Atmospheric Pressure Chemical Vapor Deposition with High Durability against Atomic Hydrogen 
Author
Japanese: 神戸 美花, Kazuo Sato, Daisuke Kobayashi, 黒川 康良, 宮島 晋介, Makoto Fukawa, Naoki Taneda, 山田 明, 小長井 誠.  
English: Mika Kambe, Kazuo Sato, Daisuke Kobayashi, Yasuyoshi Kurokawa, Shinsuke Miyajima, Makoto Fukawa, Naoki Taneda, Akira Yamada, Makoto Konagai.  
Language English 
Journal/Book name
Japanese: 
English:Jpn. J. Appl. Phys. 
Volume, Number, Page Vol. 45    No. 10    pp. L291-L293
Published date Mar. 2006 
Publisher
Japanese: 
English: 
Conference name
Japanese: 
English: 
Conference site
Japanese: 
English: 
Abstract The durability of textured transparent conductive oxide (TCO) thin films against atomic hydrogen was investigated. An ultrathin TiO2 layer of 2 nm thickness was deposited on textured fluorine-doped tin oxide (SnO2:F) films, successively by atmospheric pressure chemical vapor deposition (AP-CVD). TCO films with a TiO2 layer showed a higher optical transmittance and a lower resistivity after exposure to atomic hydrogen excited by very high frequency (VHF) plasma, while TCO films without a TiO2 layer showed a lower optical transmittance and a higher resistivity after the exposure. These TCO films were characterized by X-ray photoelectron spectroscopy (XPS) and secondary ion mass spectroscopy (SIMS) before and after the exposure to atomic hydrogen.

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