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Title
Japanese:２段階シリサイド化によるHf混晶化PtSiの極薄膜化にかんする検討 
English: 
Author
Japanese: 高峻, 石川純平, 大見俊一郎.  
English: Jun Gao, Jumpei Ishikawa, Shun-ichiro Ohmi.  
Language Japanese 
Journal/Book name
Japanese:春季第５７回応用物理学関係連合講演会予稿集 
English: 
Volume, Number, Page         p. 13-178
Published date Mar. 2010 
Publisher
Japanese:応用物理学会 
English: 
Conference name
Japanese:春季第５７回応用物理学関係連合講演会 
English: 
Conference site
Japanese:東海大学 
English: 

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