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Title
Japanese:希釈酸素雰囲気熱処理を用いたLaシリケート/Si MOS構造のVFB/Vthシフトの低EOTへの適用 
English: 
Author
Japanese: 鈴木 拓也, 川那子高暢, 角嶋邦之, パールハットアヘメト, 筒井一生, 西山彰, 杉井信之, 名取研二, 服部健雄, 岩井洋.  
English: 鈴木 拓也, Takamasa Kawanago, Kuniyuki KAKUSHIMA, Ahmet Parhat, KAZUO TSUTSUI, 西山彰, Nobuyuki Sugii, KENJI NATORI, takeo hattori, HIROSHI IWAI.  
Language Japanese 
Journal/Book name
Japanese: 
English: 
Volume, Number, Page        
Published date Sept. 2010 
Publisher
Japanese: 
English: 
Conference name
Japanese:第７１回応用物理学会学術講演会 
English: 
Conference site
Japanese:長崎大学 
English: 

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