ラジカル酸窒化法を用いたCo2FeSi/SiOxNy/Siトンネル接合の形成

Publication Information

Title

Japanese:	ラジカル酸窒化法を用いたCo2FeSi/SiOxNy/Siトンネル接合の形成
English:	Formation of Co2FeSi/SiOxNy/Si tunnel junctions using radical oxinitradation technique

Author

Japanese:	髙村陽太, 林建吾, 周藤悠介, 菅原聡.
English:	Yota Takamura, Kengo Hayashi, Yusuke Shuto, Satoshi Sugahara.

Language

Japanese

Journal/Book name

Japanese:
English:

Volume, Number, Page

31p-ZS-12

Published date

Sept. 6, 2011

Publisher

Japanese:
English:

Conference name

Japanese:	第72回応用物理学会学術講演会
English:	The 72nd Fall Meeting, 2011

Conference site

Japanese:	山形
English:	Yamagata

Official URL