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Title
Japanese:SOI 基板上多層アモルファスシリコン導波路の低損失伝搬特性 
English:Low-loss multiple-stacked amorphous silicon wire waveguide on SOI 
Author
Japanese: 姜 晙炫, 渥美 裕樹, 小田 学, 西山 伸彦, 荒井 滋久.  
English: JoonHyun KANG, Yuki ATSUMI, Manabu ODA, Nobuhiko NISHIYAMA, Shigehisa ARAI.  
Language Japanese 
Journal/Book name
Japanese: 
English: 
Volume, Number, Page Tokyo    P-20   
Published date Nov. 25, 2011 
Publisher
Japanese: 
English: 
Conference name
Japanese:シリコン・フォトニクス研究会 
English:TECHUNICAL MEETING ON SILICON PHOTONICS 
Conference site
Japanese:東京 
English:Tokyo 
Abstract Low-loss amorphous-silicon (a-Si) waveguides comprising three vertically stacked layers prepared onsilicon-on-insulator substrates are demonstrated. All the process temperatures were regulated below 400°C for theCMOS backend process compatibility. The measured propagation loss was 3.7 dB/cm even in the case of the 3rd layera-Si waveguide.

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