Formation of half-metallic tunnel junctions of Co2FeSi/SiOxNy/Si using radical oxynitridation technique

Publication Information

Title

Japanese:
English:	Formation of half-metallic tunnel junctions of Co2FeSi/SiOxNy/Si using radical oxynitridation technique

Author

Japanese:	高村陽太, 林建吾, 周藤悠介, 菅原聡.
English:	Y. Takamura, K. Hayashi, Y. Shuto, S. Sugahara.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

DD-9 p. 96

Published date

June 22, 2011

Publisher

Japanese:
English:

Conference name

Japanese:
English:	Electronic Materials Conf. (EMC) 2011

Conference site

Japanese:
English:	Santa Barbara, CA