窒素プラズマ活性化を用いたIII-V/Si直接貼付とそのハイブリッドレーザへの応用

Publication Information

Title

Japanese:	窒素プラズマ活性化を用いたIII-V/Si直接貼付とそのハイブリッドレーザへの応用
English:	III-V/Si Direct Bonding by N2 Plasma Surface Activation and Its Application to Hybrid Laser

Author

Japanese:	林侑介, 長部亮, 福田渓太, 鈴木純一, 渥美裕樹, 姜晙炫, 西山伸彦, 荒井滋久.
English:	Yuusuke Hayashi, Ryou Osabe, Keita Fukuda, Junichi Suzuki, Yuki Atsumi, JoonHyun Kang, Nobuhiko Nishiyama, SHIGEHISA ARAI.

Language

Japanese

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Dec. 13, 2012

Publisher

Japanese:
English:

Conference name

Japanese:	レーザ・量子エレクトロニクス研究会
English:	Technical Committee on Lasers and Quantum Electronics(LQE)

Conference site

Japanese:	東京
English: