対向ターゲット式スパッタ法を用いたフルホイスラー合金Co2FeSi薄膜の作製と評価

Publication Information

Title

Japanese:	対向ターゲット式スパッタ法を用いたフルホイスラー合金Co2FeSi薄膜の作製と評価
English:	Characterization of full-Heusler Co2FeSi alloy thin films formed by facing target sputtering method

Author

Japanese:	高村陽太, 鈴木隆寛, 藤野頼信, 中川茂樹.
English:	Yota takamura, Takahiro Suzuki, Yorinobu Fujino, Shigeki Nakagawa.

Language

Japanese

Journal/Book name

Japanese:	第37回日本磁気学会学術講演概要集2013
English:	DIGETS ON THE 37TH ANNUAL CONFERRENCE ON MAGNETICS IN JAPAN 2013

Volume, Number, Page

3pC-11 p. 56

Published date

Sept. 3, 2013

Publisher

Japanese:
English:

Conference name

Japanese:	第37回日本磁気学会学術講演会
English:	The 37th Annual Conference on MAGNETICS in Japan

Conference site

Japanese:	北海道札幌市
English:	Sapporo, Hokkaido