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Title
Japanese: 
English:Mobility Improvement of La-silicate MOSFET by W2C Gate Electrode 
Author
Japanese: K. Tuokedaerhan, 細田修平, 角嶋邦之, 片岡好則, 西山彰, 杉井信之, 若林整, 筒井一生, 名取研二, 岩井洋.  
English: K. Tuokedaerhan, Shuhei Hosoda, Kuniyuki KAKUSHIMA, 片岡好則, 西山彰, Nobuyuki Sugii, Hitoshi Wakabayashi, KAZUO TSUTSUI, Kenji Natori, HIROSHI IWAI.  
Language English 
Journal/Book name
Japanese: 
English:K. Tuokedaerhan, S. Hosoda, K. Kakushima, Y. Kataoka, A. Nishiyama, N. Sugii, H. Wakabayashi, K. Tsutsui, K. Natori, H. Iwai, “Mobility Improvement of La-silicate MOSFET by W2C Gate Electrode”, The Workshop on Future Trend of Nanoelectronics:WIMNACT 39, February 7, 2014, Suzukake Hall, Suzukakedai Campus, Tokyo Institute of Technology, Japan 
Volume, Number, Page        
Published date 2014 
Publisher
Japanese: 
English: 
Conference name
Japanese: 
English:The Workshop on Future Trend of Nanoelectronics:WIMNACT 39 
Conference site
Japanese: 
English: 

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