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Publication Information
Title
Japanese:
La2O3/ InGaAs界面ラフネスに及ぼすALDプロセスの影響
English:
Author
Japanese:
大嶺洋
,
ザデハサン ダリユーシユ
,
角嶋邦之
,
西山彰
,
杉井信之
,
片岡好則
,
若林整
,
筒井一生
,
名取研二
,
岩井洋
.
English:
Hiroshi Oomine
,
DARYOUSH ZADEH
,
Kuniyuki KAKUSHIMA
,
Akira Nishiyama
,
Nobuyuki Sugii
,
Yoshinori Kataoka
,
Hitoshi Wakabayashi
,
KAZUO TSUTSUI
,
Kenji Natori
,
HIROSHI IWAI
.
Language
Japanese
Journal/Book name
Japanese:
English:
Volume, Number, Page
Published date
2014
Publisher
Japanese:
English:
Conference name
Japanese:
第61回応用物理学会春季学術講演会
English:
Conference site
Japanese:
English:
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Tokyo Institute of Technology All rights reserved.