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Title
Japanese:PLD法によるエピタキシャルYSZ薄膜を用いた酸素センサーの作製と評価 
English:Fabrication and characterization of O2 sensor using YSZ epitaxial thin-film deposited by PLD 
Author
Japanese: 海老澤琢, 永原和聡, 浜崎純一, 塩田忠, 櫻井修, Jeffrey Cross, 篠崎和夫, 脇谷尚樹.  
English: 海老澤琢, Kazuto Nagahara, Junichi Hamasaki, Tadashi SHIOTA, osamu sakurai, Jeffrey Scott Cross, KAZUO SHINOZAKI, naoki wakiya.  
Language Japanese 
Journal/Book name
Japanese:日本セラミックス協会第32回エレクトロセラミックス研究討論会講演予稿集 
English: 
Volume, Number, Page     2P08    p. 48
Published date Oct. 26, 2012 
Publisher
Japanese: 
English: 
Conference name
Japanese:日本セラミックス協会第32回エレクトロセラミックス研究討論会 
English:The 32nd Electronics Division Meeting of the Ceramic Society of Japan 
Conference site
Japanese:東京 
English: 
Abstract Electrical properties of epitaxially grown yttria stabilized zirconia(YSZ) thin films on <100> Si substrate were measured. YSZ thin film with 100nm thickness was deposited by PLD. Si substrate was partially etched with 400μm in diameter by reactive ion etching apparatus. The apparent activation energy determined by AC impedance measurement showed lower value than that of measured without etching.

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