Spin accumulation in Si channels using CoFe/MgO/Si and CoFe/AlOx/Si tunnel contacts with high quality tunnel barriers prepared by radical-oxygen annealing

Publication Information

Title

Japanese:
English:	Spin accumulation in Si channels using CoFe/MgO/Si and CoFe/AlOx/Si tunnel contacts with high quality tunnel barriers prepared by radical-oxygen annealing

Author

Japanese:	悪七泰樹, 高村陽太, 周藤悠介, 菅原聡.
English:	T. Akushichi, Y. Takamura, Y. Shuto, S. Sugahara.

Language

English

Journal/Book name

Japanese:
English:	J. Appl. Phys.

Volume, Number, Page

Vol. 117 No. 17 pp. 17B531/1-4

Published date

May 5, 2015

Publisher

Japanese:
English:	AIP Publishing LLC

Conference name

Japanese:
English:

Conference site

Japanese:
English:

DOI