Mask Manufacturability Aware Post OPC Algorithm For Optical Lithography

Publication Information

Title

Japanese:
English:	Mask Manufacturability Aware Post OPC Algorithm For Optical Lithography

Author

Japanese:	AWAD Ahmed, 高橋篤司.
English:	Ahmed Awad, Atsushi Takahashi.

Language

English

Journal/Book name

Japanese:	DAシンポジウム2015 論文集，情報処理学会シンポジウムシリーズ
English:	Proc. DA Symposium 2015, IPSJ Symposium Series

Volume, Number, Page

Vol. 2015 pp. 119-124

Published date

Aug. 19, 2015

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

File

Official URL