Surface passivation of germanium nanowires using Al2O3 and HfO2 deposited via atomic layer deposition (ALD) technique

Publication Information

Title

Japanese:
English:	Surface passivation of germanium nanowires using Al2O3 and HfO2 deposited via atomic layer deposition (ALD) technique

Author

Japanese:	SIMANULLANG MAROLOP, 宇佐美浩一, 野口智弘, Surawijaya Akhmadi, 小寺哲夫, 河野行雄, 小田俊理.
English:	Marolop Simanullang, Kouichi Usami, Tomohiro Noguchi, Akhmadi Surawijaya, Tetsuo Kodera, Yukio Kawano, Shunri Oda.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Nov. 8, 2013

Publisher

Japanese:
English:

Conference name

Japanese:
English:	26th International Microprocesses and Nanotechnology Conference

Conference site

Japanese:
English:	Royton Sapporo