Contribution of oxygen vacancies to the ferroelectric behavior of Hf0.5Zr0.5O2 thin films

Publication Information

Title

Japanese:
English:	Contribution of oxygen vacancies to the ferroelectric behavior of Hf0.5Zr0.5O2 thin films

Author

Japanese:	清水荘雄, 横内達彦, Takahiro Oikawa, 白石貴久, 木口賢紀, Akihiro Akama, Toyohiko J. Konno, Alexei Gruverman, 舟窪浩.
English:	Takao Shimizu, Tatsuhiko Yokouchi, Takahiro Oikawa, Takahisa Shiraishi, Takanori Kiguchi, Akihiro Akama, Toyohiko J. Konno, Alexei Gruverman, Hiroshi Funakubo.

Language

English

Journal/Book name

Japanese:
English:	Appl. Phys. Lett.

Volume, Number, Page

Vol. 106 pp. 112904-1-5

Published date

Mar. 18, 2015

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

DOI