A Lithographic Mask Manufacturability and Pattern Fidelity Aware OPC Algorithm

Publication Information

Title

Japanese:
English:	A Lithographic Mask Manufacturability and Pattern Fidelity Aware OPC Algorithm

Author

Japanese:	AWAD Ahmed, 高橋篤司.
English:	Ahmed Awad, Atsushi Takahashi.

Language

English

Journal/Book name

Japanese:
English:	Proc. International Symposium on VLSI Design, Automation and Test (VLSI-DAT 2016)

Volume, Number, Page

pp. 1-4

Published date

Apr. 19, 2016

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

Official URL

DOI