斜方晶相を含むエピタキシャルHfO2 基薄膜の作製と評価

Publication Information

Title

Japanese:	斜方晶相を含むエピタキシャルHfO2 基薄膜の作製と評価
English:

Author

Japanese:	片山きりは, 清水荘雄, 白石貴久, 及川貴弘, 木口賢紀, 赤間章裕, 今野豊彦, 中村奨梧, 内田寛, 舟窪浩.
English:	Kiriha Katayama, Takao Shimizu, Takahisa Shiraishi, 及川貴弘, Takanori Kiguchi, 赤間章裕, Toyohiko Konno, 中村奨梧, Hiroshi Uchida, HIROSHI FUNAKUBO.

Language

Japanese

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

May 20, 2015

Publisher

Japanese:
English:

Conference name

Japanese:	第32回強誘電体応用会議（FMA 32）
English:

Conference site

Japanese:	京都市
English: