Low Temperature MOCVD deposited Ta2O5 films with good dielectric property from Ta(NtBu)(OtBu)3 and O2

Publication Information

Title

Japanese:
English:	Low Temperature MOCVD deposited Ta2O5 films with good dielectric property from Ta(NtBu)(OtBu)3 and O2

Author

Japanese:	千葉洋一, Ken-ichi Tada, Taishi Furukawa, Toshiki Yamamoto, Tadahiro Yotsuya, Noriaki Oshima, 舟窪浩.
English:	Hirokazu Chiba, Ken-ichi Tada, Taishi Furukawa, Toshiki Yamamoto, Tadahiro Yotsuya, Noriaki Oshima, Hiroshi Funakubo.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Oct. 19, 2015

Publisher

Japanese:
English:

Conference name

Japanese:
English:	STAC-9 & TOEO-9

Conference site

Japanese:
English:	Ibaraki