固相成長法を用いた強誘電体HfO2 基薄膜のエピタキシャル成長と特性評価

Publication Information

Title

Japanese:	固相成長法を用いた強誘電体HfO2 基薄膜のエピタキシャル成長と特性評価
English:

Author

Japanese:	三村和仙, 片山きりは, 清水荘雄, 舟窪浩, 内田寛, 木口賢紀, 赤間章裕, 今野豊彦.
English:	Takanori Mimura, Kiriha Katayama, Takao Shimizu, HIROSHI FUNAKUBO, Hiroshi Uchida, Takanori Kiguchi, 赤間章裕, Toyohiko Konno.

Language

Japanese

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Jan. 7, 2016

Publisher

Japanese:
English:

Conference name

Japanese:	第54回セラミックス基礎科学討論会
English:

Conference site

Japanese:	佐賀市
English: