Why high-pressure sputtering must be avoided to deposit a-In-Ga-Zn-O films

Publication Information

Title

Japanese:
English:	Why high-pressure sputtering must be avoided to deposit a-In-Ga-Zn-O films

Author

Japanese:	井手啓介, 菊池満帆, 笹瀬雅人, 平松秀典, 雲見日出也, 細野秀雄, 神谷利夫.
English:	K.Ide, M. Kikuchi, M. Sasase, H. Hiramatsu, H. Kumomi, H. Hosono, T. Kamiya.

Language

English

Journal/Book name

Japanese:
English:	; Proc. Active-Matrix Flatpanel Displays and Devices (AMFPD2016) (2016 The 23rd International Workshop on Active-Matrix Flatpanel Displays and Devices)

Volume, Number, Page

Vol. 7-2/298-301 7-2/298-301

Published date

2017

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

DOI