Effect of ultra-thin SiOx insertion on a-Si:H (i) passivation layer deposited by facing target sputtering(5p-PB3-2)

Publication Information

Title

Japanese:
English:	Effect of ultra-thin SiOx insertion on a-Si:H (i) passivation layer deposited by facing target sputtering(5p-PB3-2)

Author

Japanese:	ファリスアキラビンモハマドズルキフリ, 白取優大, 中田和吉, 宮島晋介.
English:	Akira Faris, Yuta Shiratori, Kazuyoshi Nakada, Shinsuke Miyajima.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Sept. 5, 2017

Publisher

Japanese:
English:

Conference name

Japanese:	第78回応用物理学会秋季学術講演会
English:	The 78th JSAP Autumn Meeting, 2017

Conference site

Japanese:	福岡
English:	Fukuoka