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Publication Information
Title
Japanese:
TFT応用に向けたRFマグネトロンスパッタリング法によるMoS2膜の形成
English:
MoS2 Film Formation by RF Magnetron Sputtering for Thin Film Transistors
Author
Japanese:
大橋匠
.
English:
Takumi Ohashi
.
Type
Type:
Thesis (Ph.D.)
Country:
Japan
Language
English
Organization name
Tokyo Institute of Technology
Report number
甲第10864号
Conferred date
2018/03/26
Judge
©2007
Institute of Science Tokyo All rights reserved.