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Title
Japanese: 
English:Crystallization behavior and ferroelectric property of HfO2–ZrO2 films fabricated by chemical solution deposition 
Author
Japanese: Shuhei Nakayama, 舟窪 浩, 内田 寛.  
English: Shuhei Nakayama, Hiroshi Funakubo, Hiroshi Uchida.  
Language English 
Journal/Book name
Japanese: 
English:Jpn. J. Appl. Phys. 
Volume, Number, Page Vol. 57        pp. 11UF06-1-5
Published date Sept. 2018 
Publisher
Japanese: 
English: 
Conference name
Japanese: 
English: 
Conference site
Japanese: 
English: 
DOI https://doi.org/10.7567/JJAP.57.11UF06

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