Effects of heat treatment and in-situ high temperature XRD study on the formation of ferroelectric epitaxial Y doped HfO2 film.

Publication Information

Title

Japanese:
English:	Effects of heat treatment and in-situ high temperature XRD study on the formation of ferroelectric epitaxial Y doped HfO2 film.

Author

Japanese:	三村和仙, 清水荘雄, 木口賢紀, Akihiro Akama, Toyohiko J. Konno, 勝矢良雄, 坂田修身, 舟窪浩.
English:	Takanori Mimura, Takao Shimizu, Takanori Kiguchi, Akihiro Akama, Toyohiko J. Konno, Yoshio Katsuya, Osami Sakata, Hiroshi Funakubo.

Language

English

Journal/Book name

Japanese:
English:	Jpn. J. Appl. Phys.

Volume, Number, Page

Vol. 58 pp. SBBB09-1-5

Published date

Feb. 2019

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

DOI