Investigation of bonding strength between (InP, Si)/SiO2 and Si by Surface Activated Bonding based on Fast Atom Beam assisted by Si nano-film

Publication Information

Title

Japanese:	Investigation of bonding strength between (InP, Si)/SiO2 and Si by Surface Activated Bonding based on Fast Atom Beam assisted by Si nano-film
English:	Investigation of bonding strength between (InP, Si)/SiO2 and Si by Surface Activated Bonding based on Fast Atom Beam assisted by Si nano-film

Author

Japanese:	Fang Weicheng, 王雨寧, 雨宮智宏, 西山伸彦.
English:	Weicheng Fang, Yuning Wang, Tomohiro Amemiya, Nobuhiko Nishiyama.

Language

Japanese

Journal/Book name

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English:

Volume, Number, Page

Published date

Sept. 2019

Publisher

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Conference name

Japanese:	第80回応用物理学会秋季学術講演会
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Conference site

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English: