Ferroelectricity in YO1.5-HfO2 films around 1 μm in thickness | Tokyo Tech Research Repository (T2R2)

Publication Information

Title

Japanese:
English:	Ferroelectricity in YO1.5-HfO2 films around 1 μm in thickness

Author

Japanese:	三村和仙, 清水荘雄, 舟窪浩.
English:	Takanori Mimura, Takao Shimizu, Hiroshi Funakubo.

Language

English

Journal/Book name

Japanese:
English:	Appl. Phys. Lett.

Volume, Number, Page

Vol. 115 pp. 032901

Published date

July 2019

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

DOI

https://doi.org/10.1063/1.5097880

©2007 Tokyo Institute of Technology All rights reserved.