Endurance Improvement in Ferroelectric Y-doped HfO2 Thin Films on NiSi2 with Low-Thermal Budget Processing

Publication Information

Title

Japanese:
English:	Endurance Improvement in Ferroelectric Y-doped HfO2 Thin Films on NiSi2 with Low-Thermal Budget Processing

Author

Japanese:	モリナレイエスホエル, 星井拓也, 大見俊一郎, 舟窪浩, 堀敦, Ichiro Fujiwara, 若林整, 筒井一生, 角嶋邦之.
English:	Joel Molina-Reyes, Takuya Hoshii, Shun-Ichiro Ohmi, Hiroshi Funakubo, Atsushi Hori, Ichiro Fujiwara, Hitoshi Wakabayashi, Kazuo Tsutsui, Kuniyuki Kakushima.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Sept. 2019

Publisher

Japanese:
English:

Conference name

Japanese:
English:	Solid State Devices and Materials (SSDM2019)

Conference site

Japanese:
English:	Nagoya