Arbitary control of diffusion potential between plasmonic metal and semiconductor by angstrom thickness of interface dipoles

Publication Information

Title

Japanese:	Arbitary control of diffusion potential between plasmonic metal and semiconductor by angstrom thickness of interface dipoles
English:	Arbitary control of diffusion potential between plasmonic metal and semiconductor by angstrom thickness of interface dipoles

Author

Japanese:	Tomoya Oshikiri, Hiroki Sawayanagi, Keisuke Nakamura, Kosei Ueno, Takayoshi Katase, Hiromichi Ohta, Hiroaki Misawa.
English:	Tomoya Oshikiri, Hiroki Sawayanagi, Keisuke Nakamura, Kosei Ueno, Takayoshi Katase, Hiromichi Ohta, Hiroaki Misawa.

Language

English

Journal/Book name

Japanese:	The Journal of Chemical Physics
English:	The Journal of Chemical Physics

Volume, Number, Page

vol. 152 p. 034705

Published date

Jan. 2020

Publisher

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English:

Conference name

Japanese:
English:

Conference site

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English: