NiSi2 as a Promotor of Ferroelectricity in Si-doped HfO2 Thin Films after Low-Thermal Budget Processing

Publication Information

Title

Japanese:
English:	NiSi2 as a Promotor of Ferroelectricity in Si-doped HfO2 Thin Films after Low-Thermal Budget Processing

Author

Japanese:	モリナレイエスホエル, Haruki Iwatsuka, Takuya Hoshii, 大見俊一郎, 舟窪浩, 堀敦, Ichiro Fujiwara, 若林整, Kazuo Tsutsui, 角嶋邦之.
English:	Joel Molina-Reyes, Haruki Iwatsuka, Takuya Hoshii, Shun-Ichiro Ohmi, Hiroshi Funakubo, Atsushi Hori, Ichiro Fujiwara, Hitoshi Wakabayashi, Kazuo Tsutsui, Kuniyuki Kakushima.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

June 9, 2019

Publisher

Japanese:
English:

Conference name

Japanese:
English:	VLSI 2019 (2019 Symposia on VLSI Technology and Circuits)

Conference site

Japanese:
English:	Kyoto