Robust Ferroelectricity in Y-Doped HfO2 Films | Tokyo Tech Research Repository (T2R2)

Publication Information

Title

Japanese:
English:	Robust Ferroelectricity in Y-Doped HfO2 Films

Author

Japanese:	清水荘雄, 三村和仙, 舟窪浩.
English:	Takao Shimizu, Takanori Mimura, Hiroshi Funakubo.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

July 14, 2019

Publisher

Japanese:
English:

Conference name

Japanese:
English:	F2cπ2 2019 (Joint ISAF-ICE-EMF-IWPM-PFM meeting 2019)

Conference site

Japanese:
English:	Lausanne

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