Determination of oxide traps distribution in high-k/InGaAs MOS capacitor by capacitance-voltage measurement

Publication Information

Title

Japanese:
English:	Determination of oxide traps distribution in high-k/InGaAs MOS capacitor by capacitance-voltage measurement

Author

Japanese:	DOU CHUN MENG, 角嶋邦之, 片岡好則, 西山彰, 杉井信之, 若林整, 筒井一生, 名取研二, H. Iwai.
English:	Chunmeng Dou, Kakushima, Y. Kataoka, A. Nishiyama, N. Sugii, H. Wakabayashi, K. Tsutsui, K. Natori, H. Iwai.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Feb. 7, 2014

Publisher

Japanese:
English:

Conference name

Japanese:
English:	The Workshop on Future Trend of Nanoelectronics: WIMNACT 39

Conference site

Japanese:
English:	Yokohama