Band Bending Measurement of HfO2/SiO2/Si Capacitor with ultra-thin La2O3 Insertion by XPS

Publication Information

Title

Japanese:
English:	Band Bending Measurement of HfO2/SiO2/Si Capacitor with ultra-thin La2O3 Insertion by XPS

Author

Japanese:	角嶋邦之, Kouichi Okamoto, 足立学, 舘喜一, 宋在烈, Soushi Sato, 川那子高暢, AHMET PARHAT, 筒井一生, 杉井信之, 服部健雄, 岩井洋.
English:	Kuniyuki Kakushima, Kouichi Okamoto, Manabu Adachi, Kiichi Tachi, Jaeyeol Song, Soushi Sato, Takamasa Kawanago, Parhat Ahmet, Kazuo Tsutsui, Nobuyuki Sugii, Takeo Hattori, Hiroshi Iwai.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Nov. 12, 2007

Publisher

Japanese:
English:

Conference name

Japanese:
English:	Fifth International Symposium on Control of Semiconductor Interfaces (ISCSI2007)

Conference site

Japanese:
English:	Tokyo