Sheet Resistance Reduction of MoS2 Film using Sputtering and Chlorine Plasma Treatment followed by Sulfur Vapor Annealing

Publication Information

Title

Japanese:
English:	Sheet Resistance Reduction of MoS2 Film using Sputtering and Chlorine Plasma Treatment followed by Sulfur Vapor Annealing

Author

Japanese:	濱田拓也, Shigetaka Tomiya, Tetsuya Tatsumi, 濱田昌也, 堀口大河, 角嶋邦之, 筒井一生, 若林整.
English:	Takuya Hamada, Shigetaka Tomiya, Tetsuya Tatsumi, Masaya Hamada, Taiga Horiguchi, Kuniyuki Kakushima, Kazuo Tsutsui, Hitoshi Wakabayashi.

Language

English

Journal/Book name

Japanese:
English:	Journal of the Electron Devices Society (J-EDS)

Volume, Number, Page

Vol. 9 Page 278-285

Published date

Jan. 2021

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

DOI