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Title
Japanese:[23a-P08-1] 高濃度ホウ素ドープシリコンターゲットを用いたp型微結晶シリコンの作製と評価 
English:[23a-P08-1] Investigation of p-type Microcrystalline Silicon Sputtered Using Highly Boron Doped Silicon Sputtering Target, 宮島 晋介 
Author
Japanese: 白取 優大, 宮島 晋介.  
English: Yuta Shiratori, Shinsuke Miyajima.  
Language Japanese 
Journal/Book name
Japanese: 
English: 
Volume, Number, Page        
Published date Sept. 21, 2021 
Publisher
Japanese: 
English: 
Conference name
Japanese:第82回 応用物理学会秋季学術講演会 
English:The 82nd JSAP Autumn Meeting 2021 
Conference site
Japanese: 
English: 

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