Fast EUV lithography simulation using convolutional neural network

Publication Information

Title

Japanese:
English:	Fast EUV lithography simulation using convolutional neural network

Author

Japanese:	田邊容由, 佐藤真平, 高橋篤司.
English:	Hiroyoshi Tanabe, Shimpei Sato, Atsushi Takahashi.

Language

English

Journal/Book name

Japanese:
English:	Journal of Micro/Nanopatterning, Materials and Metrology (JM3)

Volume, Number, Page

Vol. 20 No. 4 pp. 1-14

Published date

Sept. 24, 2021

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

File

DOI