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Publication Information
Title
Japanese:
English:
Fast 3D lithography simulation by convolutional neural network: POC study
Author
Japanese:
田邊 容由
,
佐藤 真平
,
高橋 篤司
.
English:
Hiroyoshi Tanabe
,
Shimpei Sato
,
Atsushi Takahashi
.
Language
English
Journal/Book name
Japanese:
English:
Proc. SPIE 11518, Photomask Technology 2020, 115180L
Volume, Number, Page
Published date
Sept. 20, 2020
Publisher
Japanese:
English:
Conference name
Japanese:
English:
Conference site
Japanese:
English:
DOI
https://doi.org/10.1117/12.2575971
©2007
Institute of Science Tokyo All rights reserved.