Evaluation of convolutional neural network for fast extreme ultraviolet lithography simulation using imec 3 nm node mask patterns

Publication Information

Title

Japanese:
English:	Evaluation of convolutional neural network for fast extreme ultraviolet lithography simulation using imec 3 nm node mask patterns

Author

Japanese:	田邊容由, 神宮司明良, 高橋篤司.
English:	Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi.

Language

English

Journal/Book name

Japanese:
English:	Journal of Micro/Nanopatterning, Materials and Metrology (JM3)

Volume, Number, Page

Vol. 22 Issue 2 024201

Published date

June 15, 2023

Publisher

Japanese:
English:	Society of Photo-optical Instrumentation Engineers

Conference name

Japanese:
English:

Conference site

Japanese:
English:

File

DOI